TOP RING
- Etch Process
Top Ring is one of the critical parts for the Etching Process in the chamber to uniformly distribute the plasma onto the wafers.
BOTTOM RING
- Etch Process
Bottom Ring is used to protect the lower portion of the ESC.
SINGLE RING
- Etch Process
Single Ring is to assist in applying the plasma uniformly onto the wafer.
BAFFLE
- CVD Process
During the CVD Process, Baffle inside the Dome will control the flow of gas and etched residues.
NAT GATE SHIELD
- CVD Process
NAT Gate Shield is used to protect the plasma inside of the chamber to have best process environment.